Title:
SELECTIVE ETCHING
Document Type and Number:
Japanese Patent JPS5286073
Kind Code:
A
Abstract:
PURPOSE:To improve etching precision and to prevent disconnection at the edge of Al wire by using a mask of negative type photoresist of high viscosity, which can form thick coating at least on cliff region, during the process for etching layer with cliff region uniformly.
Inventors:
URIYUU TAKESHI
Application Number:
JP205276A
Publication Date:
July 16, 1977
Filing Date:
January 12, 1976
Export Citation:
Assignee:
HITACHI LTD
International Classes:
H01L29/73; H01L21/027; H01L21/30; H01L21/302; H01L21/331; H01L29/08; (IPC1-7): H01L21/302; H01L29/08