Title:
SEMICONDUCTOR MANUFACTURING DEVICE
Document Type and Number:
Japanese Patent JPS59191342
Kind Code:
A
Abstract:
PURPOSE:To suppress the increase in the cost of equipment by a method wherein a cassette placing pedestal is provided in a preparatory chamber in a pivotally and vertically moving manner, thereby enabling to arbitrarily change the supply and discharge direction of a wafer. CONSTITUTION:An electrode 11 for placement of a wafer whereon an RF power source 13 is provided in a pivotally moving manner in a reaction chamber 10 which will be decompressed and evacuated, and an opposing electrode 12 having the prescribed discharge space with the electrode 11 is provided therein facing the upper and the lower directions. Preparatory chambers 80 and 90 which will be decompressed or evacuated through the intermediaries of gate valves 43 and 44 are provided in said reaction chamber 10. Cassette-placing pedestals 81 and 91 are provided in the preparatory chambers 80 and 90, and gate valves 82 and 92 are provided corresponding to a pre-treatment device and an after-treatment device, thereby enabling said cassette-placing pedestals 81 and 91 to perform pivotal and vertical movements using the driving devices 83 and 93 for pivotal and vertical movements provided outside the chambers 80 and 90.
Inventors:
SAIKAI MASAHARU
KANAI NORIO
FUJII TAKASHI
KANAI NORIO
FUJII TAKASHI
Application Number:
JP6539383A
Publication Date:
October 30, 1984
Filing Date:
April 15, 1983
Export Citation:
Assignee:
HITACHI LTD
International Classes:
H01L21/00; H01L21/677; (IPC1-7): H01L21/02
Attorney, Agent or Firm:
Katsuo Ogawa (1 person outside)