Title:
SEMICONDUCTOR PROCESSOR
Document Type and Number:
Japanese Patent JPH05251543
Kind Code:
A
Abstract:
PURPOSE: To reduce particles generated at the time of conveying a semiconductor wafer in an apparatus for processing the wafer in a vacuum chamber.
CONSTITUTION: A gas inlet 11 is provided in a conveying chamber 6. A flowrate controller 9 is operated under the control of a control circuit 8 in response to a difference of an output of a vacuum meter 5 of a processing chamber 1 and an output of a vacuum meter 12 of the chamber 6. Thus, an internal pressure of the chamber 1 is equalized to that of the chamber 6. Then, a gate valve 13 is opened to reduce particles generated in the respective chambers.
Inventors:
YOSHIDA HIDEAKI
Application Number:
JP8326092A
Publication Date:
September 28, 1993
Filing Date:
March 05, 1992
Export Citation:
Assignee:
KYUSHU NIPPON ELECTRIC
International Classes:
H01L21/677; H01L21/68; (IPC1-7): H01L21/68
Attorney, Agent or Firm:
Toshi Inoguchi