To provide a semiconductor storage device wherein a thin film capacitor with a ferroelectric film is used and high integration is possible.
The device is constituted by arranging a plurality of memory cells having a thin film capacitor with a ferroelectric film 14 and a pair of electrodes 13, 15 opposed through the ferroelectric film 14, and a transfer gate transistor connected to a thin film capacitor in a matrix form. A voltage which is equivalent to the width of a hysterisis curve when a thin film capacitor is subjected to saturation polarization amounts to 5% or more and 20% or less to a voltage difference between a positive direction and a negative direction during write operation. Furthermore, a residual polarization amount when a thin film capacitor is subjected to saturation polarization is 5% or more and 30% or less to a total polarization amount when a voltage during the write operation is applied.
ABE KAZUHIDE
FUKUSHIMA SHIN
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