Title:
SEMICONDUCTOR THIN FILM FORMING SYSTEM
Document Type and Number:
Japanese Patent JP3792473
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To form a uniform film over a long time by prolonging the maintenance cycle of a semiconductor thin film forming system.
SOLUTION: An electrode is provided with a plurality of sets of a plurality of reaction gas ejection openings 15 and the plurality of sets of reaction gas ejection openings 15 are used by an ejection opening shielding means 16 while being switched for each set such that the maintenance period can be prolonged by the amount corresponding to the number of sets.
Inventors:
Hiroshi Ishimaru
Norihiro Terada
Norihiro Terada
Application Number:
JP2000091282A
Publication Date:
July 05, 2006
Filing Date:
March 29, 2000
Export Citation:
Assignee:
Sanyo Electric Co., Ltd.
International Classes:
C23C16/455; H01L21/205; (IPC1-7): H01L21/205; C23C16/455
Domestic Patent References:
| JP4000654U | ||||
| JP7014822A | ||||
| JP8045910A | ||||
| JP7029830A | ||||
| JP7045594A | ||||
| JP1156477A |
Attorney, Agent or Firm:
Torii Hiroshi