PURPOSE: To use multiple beam channels having one length to obtain X-ray lithography under the same condition outside of a shielding wall by locating the shielding wall of beam channels for supplying SOR light while adjusting the wall to the beam channels and not to a building.

CONSTITUTION: Length of multiple beam channels 31 for taking the SOR light off to be provided in the tangent line direction of deflecting magnets 24 of a storage ring 22 are formed into the same length, and a shielding wall 32 for shielding radiation on the way of the beam channels 31 is located on a concentric circle around of a curvature center O of each deflecting magnet 24, and an impulse wave delaying tube is located in a passing through part of the shielding wall. Exposure under the same condition outside of the shielding wall is thereby enabled to use a space for the shielding wall effectively without failure of maintenance of the beam channels 31.