Title:
シリカの精製方法、およびシリカ粒子
Document Type and Number:
Japanese Patent JP7174483
Kind Code:
B2
Abstract:
To provide a purification method capable of obtaining high-purity silica in which a concentration of a metal element subjected to be removed is sufficiently reduced by a relatively simple method even from a raw material that may contain an impurity metal element such as liquid glass.SOLUTION: The silica purification method that purifies silica produced by neutralization of an aqueous solution of alkali silicate with an aqueous solution of a mineral acid includes the steps of: receiving in an immersion tank the silica having generated, immersing a silica layer composed of aggregate of the silica and gaps thereof in an aqueous solution that has pH of 1.0 or less, contains a mineral acid, and is added with a complexing agent; and flowing the aqueous solution at a relative velocity with respect to the silica layer in a range of 0.01 cm/min or more to 0.2 cm/min or less, and with a water flow rate as much as a predetermined amount that is 1.0 time or more of a volume of the immersion tank of a range where the silica layer exists.SELECTED DRAWING: Figure 1
Inventors:
Kiyoshi Nonaka
Kenta Masuda
Yuki Ichitsubo
Kenta Masuda
Yuki Ichitsubo
Application Number:
JP2018195839A
Publication Date:
November 17, 2022
Filing Date:
October 17, 2018
Export Citation:
Assignee:
Taiheiyo Cement Co., Ltd.
International Classes:
C01B33/18; C01B33/12
Domestic Patent References:
| JP2001192223A | ||||
| JP2015020916A | ||||
| JP2003146646A | ||||
| JP2014012618A | ||||
| JP2001233628A | ||||
| JP3252308A | ||||
| JP9110413A | ||||
| JP7187646A |
Attorney, Agent or Firm:
Takeo Fukuchi
Yoichi Shirakawa
Yoichi Shirakawa