Title:
SILICON NITRIDE SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2023124743
Kind Code:
A
Abstract:
To reduce color unevenness generated on a surface of a silicon nitride substrate.SOLUTION: A silicon nitride substrate formed by nitriding silicon contained in a sheet-shaped formed body includes a first surface and a second surface opposite to the first surface. If ΔE*ab refers to color difference between a center and an edge of at least one of the first and second surfaces, then ΔE*ab≤1.5 is satisfied.SELECTED DRAWING: None
Inventors:
FUKUMOTO REI
KAGA YOICHIRO
SHIMADA KAORU
KAGA YOICHIRO
SHIMADA KAORU
Application Number:
JP2022038027A
Publication Date:
September 06, 2023
Filing Date:
March 11, 2022
Export Citation:
Assignee:
PROTERIAL LTD
International Classes:
C04B35/591
Domestic Patent References:
| JP2002029851A | 2002-01-29 | |||
| JP2018184333A | 2018-11-22 | |||
| JPS52121613A | 1977-10-13 |
Foreign References:
| WO2017170247A1 | 2017-10-05 |
Attorney, Agent or Firm:
Patent Attorney Tsutsui International Patent Office
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