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Title:
SPUTTERING TARGET MATERIAL COMPOSED OF CERAMICS-METAL COMPOSITE MATERIAL, SPUTTERING TARGET, AND METHOD FOR PRODUCING THEM
Document Type and Number:
Japanese Patent JP2008179900
Kind Code:
A
Abstract:

To provide a sputtering target material where the generation of arcing and splashes upon sputtering can be effectively prevented, and, particularly, regarding the arcing, it can be made zero actually.

The sputtering target material comprises: a metal phase (A) at least containing Co; a ceramics phase (B) obtained by forming particles with the major axis particle diameter of 10 m; and a ceramics-metal reaction phase (C) at least containing Co. The ceramics phase (B) is scattered into the metal phase (A), and also, a layer formed by the ceramics-metal reaction phase (C) is interposed between the ceramics phase (B) and the metal phase (A).


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Inventors:
KATO KAZUTERU
Application Number:
JP2008046217A
Publication Date:
August 07, 2008
Filing Date:
February 27, 2008
Export Citation:
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Assignee:
MITSUI MINING & SMELTING CO
International Classes:
C23C14/34; C22C1/05; C22C1/10
Attorney, Agent or Firm:
Shunichiro Suzuki
Koji Makimura
Chihata Takahata



 
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