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Title:
下地基板、下地基板の製法及び13族窒化物結晶の製法
Document Type and Number:
Japanese Patent JP6816008
Kind Code:
B2
Abstract:
An underlying substrate 14 according to an embodiment of the present invention includes a seed crystal layer 16 of a group 13 nitride crystal on a' sapphire substrate 15. Projections 16a and recesses 16b repeatedly appear in stripe shapes at a principal surface of the seed crystal layer 16. The projections 16a have a level difference ha of 0.3 to 40 µm and a width wa of 5 to 100 µm, and the recesses 16b have a bottom thickness tb of 2 µm or more and a width wb of 50 to 500 µm.

Inventors:
Takayuki Hirao
Makoto Iwai
Katsuhiro Imai
Takashi Yoshino
Application Number:
JP2017546474A
Publication Date:
January 20, 2021
Filing Date:
September 30, 2016
Export Citation:
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Assignee:
Nippon Insulator Co., Ltd.
International Classes:
C30B29/38; C30B19/12; H01L21/20
Domestic Patent References:
JP2013063908A
JP2010024090A
JP2013193915A
Attorney, Agent or Firm:
Aitec International Patent Office