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Patent Searching and Data


Title:
SUBSTRATE DRYING EQUIPMENT
Document Type and Number:
Japanese Patent JP2004296552
Kind Code:
A
Abstract:

To enable adjusting capacity of mist by water-soluble organic solvent, and miniaturize the whole equipment without arranging a mist spraying apparatus in a drying room.

The substrate drying equipment is provided with a processing tank 81 which stores deionized water and immerses a substrate 1, an outside tank 32 which has a canopy 31 which carries out covering installation of the processing tank 81, and carries in the substrate 1 to top view, and a spraying means 41 which is installed in the outside tank 32 and sprays high temperature inert gas on a stored liquid surface from the internal processing tank 81. Further, a spraying means 51 is installed which is placed in the vicinity of the spraying means 41 of the outside tank 32, mixes water soluble organic solvent and inert gas, makes mist outside the processing tank 81, and supplies the mist, thereby spraying the mist on a stored liquid surface from above the processing tank 81. By discharging deionized water in the processing tank 81, the substrate is exposed on the liquid surface, and Maragoni effect due to mist spraying and sticking deionized water are replaced. The substrate is dried completely by flashing by spraying inert gas at a high temperature.


Inventors:
TSUJI HIROKI
SHIMADA KIYOSHI
NOBATA HIROYOSHI
Application Number:
JP2003083816A
Publication Date:
October 21, 2004
Filing Date:
March 25, 2003
Export Citation:
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Assignee:
SHIMADA PHYSICAL CHEM IND CO
International Classes:
H01L21/683; H01L21/304; H01L21/68; (IPC1-7): H01L21/304; H01L21/68
Attorney, Agent or Firm:
Makoto Hagiwara