Title:
SUBSTRATE DRYING METHOD AND DEVICE
Document Type and Number:
Japanese Patent JPH11145102
Kind Code:
A
Abstract:
To dry a substrate more securely and more quickly.
While a substrate W after water cleaning processing is supported substantially horizontally and carried by a carrier mechanism 16, a mixed gas is ejected to the substrate W by gas ejection nozzles 30 arranged above and below the substrate W, thus removing pure water adhered to the substrate W. As the mixed gas, a nitrogen gas containing IPA is ejected to the substrate W.
Inventors:
YOSHITANI MITSUAKI
MATSUMURA YOSHIO
MATSUMURA YOSHIO
Application Number:
JP30439997A
Publication Date:
May 28, 1999
Filing Date:
November 06, 1997
Export Citation:
Assignee:
DAINIPPON SCREEN MFG
International Classes:
H01L21/304; H05K3/22; (IPC1-7): H01L21/304
Attorney, Agent or Firm:
Etsushi Kotani (3 outside)
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