PURPOSE: To prevent the cracking of a substrate for film formation by sputtering during film formation by using a thermal insulating material to form the contact part of the substrate holder consisting of the contact part to be imposed with the substrate for film formation by sputtering and a frame part holding the contact part.

CONSTITUTION: The substrate holder for film formation by sputtering is formed by fixing a spacer S made of a fluororesin to be directly imposed with the outer edge part of the glass substrate G to the inner side of a substrate transporting tray T having a square frame shape. The tray T carrying the substrate G is moved in an arrow direction so as to intersect orthogonally with a target R in a vacuum chamber D and the target R is sputtered by a sputtering gas, by which the film is formed on the substrate G. Since the spacer S has a thermal insulating characteristic at this time, the smaller temp. difference between the outer edge part of the substrate G and the film forming surface on the inner side is only necessitated. The cracking of the substrate G is thus prevented.