SUBSTRATE PROCESSING APPARATUS AND ABNORMALITY DETECTION METHOD FOR SUBSTRATE PROCESSING APPARATUS

Title:

SUBSTRATE PROCESSING APPARATUS AND ABNORMALITY DETECTION METHOD FOR SUBSTRATE PROCESSING APPARATUS

Document Type and Number:

Japanese Patent JP2019161144

Kind Code:

A

Abstract:

To provide an abnormality detection technique capable of being adaptable to enlargement of a substrate in a substrate processing apparatus where the substrate and a nozzle are relatively moved while proximately facing each other.SOLUTION: A substrate processing apparatus comprises: a light-emitting part 371 which emits a light beam L along a principal surface from one end side to the other end side in a first direction of a substrate W at a front side of a discharge port in a movement direction of a nozzle with respect to the substrate W; a light-receiving part 372 which outputs a signal corresponding to the quantity of light incident into a light-receiving window 372a and in which the light-receiving window is disposed at the other end side of the substrate W on an optical path of the light beam; a detection part which detects abnormality of the substrate W on the basis of a change in the signal output by the light-receiving part; and a light regulation member 373 which is disposed between the light-emitting part and the light-receiving part, makes the light beam incident into a region in which a distance from a virtual plane is smaller than a predetermined distance in the light-receiving window at a side opposite to the substrate W rather than a virtual plane including the principal surface and, on the other hand, regulates the incidence of the light beam into a region in which the distance from the virtual plane is greater than the predetermined distance.SELECTED DRAWING: Figure 7

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