Title:
SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2006187747
Kind Code:
A
Abstract:
To provide a substrate processing apparatus which is inexpensive, removes bacteria or the like without using any chemical, and can assure a sufficient washing function.
A UV process liquid (cleaning fluid) irradiated with an ultraviolet ray by a UV irradiation device 103 inside a circulation pipeline and a dipping type UV irradiation device 105 inside a tank is supplied to a brush base 51 by a cleaning fluid supply unit 9. AT the brush base 51, the UV process liquid after the ultraviolet ray irradiation is discharged to a bristle bundle 50 from a discharge port 131 through a cleaning fluid guideway 13 to prevent a spread of the bacteria or the like on the bristle bundle 50.
Inventors:
KAWANE JUNHEI
Application Number:
JP2005002984A
Publication Date:
July 20, 2006
Filing Date:
January 07, 2005
Export Citation:
Assignee:
DAINIPPON SCREEN MFG
International Classes:
B08B3/10; B08B1/00; B08B7/04; G02F1/13; G02F1/1333; H01L21/304; H01L21/306
Attorney, Agent or Firm:
Etsushi Kotani
Takao Ito
Jiro Higuchi
Takao Ito
Jiro Higuchi