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Title:
SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2010102693
Kind Code:
A
Abstract:

To prevent opening/closing of an electromagnetic valve by a wrong manipulation from being forgotten or hazards caused by incorrect mixing of gases and to improve safety by indicating a gas flow in a gas pipe before the electromagnetic valve is actually opened/closed.

The substrate processing apparatus includes a state detection unit 44 for detecting an opening/closing request state and an opening/closing state of valves 2, 3, 36, and 38 installed at a gas pipeline 1; and an indication unit 44 for indicating a predicted state of gas flowing in the gas pipeline predicted according to the opening/closing request state of the valve and a state of gas flow flowing in the gas pipeline when the valve is opened, in a way that each state is distinguished.


Inventors:
YAMADA TOMOYUKI
OISHI MAMORU
KITAYAMA KANAKO
Application Number:
JP2009197151A
Publication Date:
May 06, 2010
Filing Date:
August 27, 2009
Export Citation:
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Assignee:
HITACHI INT ELECTRIC INC
International Classes:
G05B23/02; C23C14/52; C23C16/44; C23C16/455; G01F1/00; H01L21/22; H01L21/31; H01L21/324
Domestic Patent References:
JPH06187581A1994-07-08
JPS6437690A1989-02-08
JP2001040481A2001-02-13
JP2002258940A2002-09-13
JP2008065821A2008-03-21
JP2002025918A2002-01-25
JPH08128079A1996-05-21
JPH06187581A1994-07-08
JPS6437690A1989-02-08
JP2001040481A2001-02-13
JP2002258940A2002-09-13
JP2008065821A2008-03-21
Attorney, Agent or Firm:
Shoji Miyoshi



 
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