Title:
SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2015135843
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To efficiently recover a chemical liquid for reuse.SOLUTION: A substrate processing apparatus has an upper nozzle 181 ejecting a processing liquid toward a substrate. The upper nozzle is connected to a pure water supply unit 184 by means of a pure water introduction line 72, a connection 71 and a processing liquid common line 74 as a supply line of pure water, and the supply line is provided with a pure water introduction valve 722 as a pure water valve. A chemical liquid introduction line 73 connects a chemical liquid introduction position 713 between the upper nozzle and the pure water valve in the supply line with a chemical liquid supply unit 183. One end of a chemical recovering line 75 is connected to a chemical liquid recovering position 715 between the chemical liquid introduction line and the pure water valve in the supply line. A chemical liquid recovering unit 82 having an ejector 822, provided in the chemical liquid recovering line recovers a chemical liquid existing between the upper nozzle and the chemical liquid recovering position in the supply line after the ejection of the chemical liquid from the upper nozzle. Accordingly, it is possible to efficiently recover the chemical liquid for reuse.
Inventors:
SAWASHIMA HAYATO
Application Number:
JP2014005634A
Publication Date:
July 27, 2015
Filing Date:
January 16, 2014
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD
International Classes:
H01L21/304; H01L21/027; H01L21/306
Domestic Patent References:
| JP2003309102A | 2003-10-31 | |||
| JP2002170803A | 2002-06-14 | |||
| JPH077139U | 1995-01-31 | |||
| JP2004273838A | 2004-09-30 |
Attorney, Agent or Firm:
Masahiro Matsusaka
Tsutomu Tanaka
Masamichi Ida
Tsutomu Tanaka
Masamichi Ida