Title:
SUBSTRATE PROCESSING METHOD AND APPARATUS
Document Type and Number:
Japanese Patent JP3847767
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To inhibit influences, such as the deterioration of process liquid, for example resist liquid or developer liquid, by a thermal influence or the like, as much as possible.
SOLUTION: A storage container 499 is arranged at a lower position of an interface unit part IFU. As this arrangement position, the storage container 499 is set below in a perpendicular direction V101 from delivering part 4 or receiving part 5 which delivers and receives a substrate from/to an exposure device 3 arranged below in the perpendicular direction V100 from a substrate carrying outlet 19 of substrate delivering and receiving parts 8, 9. In the interface unit part IFU, a down flow DF in which temperature control is performed is constituted so as to directly act to at least the substrate carrying outlet 19, a delivering part 4, or a receiving part 5, and heat transmission from the substrate carrying outlet 19, the delivering part 4, or the receiving part 5 is constituted so as to be relieved.
Inventors:
Mitake Ito
Application Number:
JP2005047256A
Publication Date:
November 22, 2006
Filing Date:
February 23, 2005
Export Citation:
Assignee:
Mitake Ito
International Classes:
G03F7/30; H01L21/027; (IPC1-7): H01L21/027; G03F7/30
Domestic Patent References:
| JP2001127033A | ||||
| JP2001102298A | ||||
| JP10303110A | ||||
| JP2001005191A | ||||
| JP2002075834A | ||||
| JP10151401A |
Attorney, Agent or Firm:
Hiroyoshi Aoki
Yoshiaki Nishiyama
Koji Mizuno
Toshiro Nakamura
Yoshiaki Nishiyama
Koji Mizuno
Toshiro Nakamura
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