Title:
基板処理方法
Document Type and Number:
Japanese Patent JP6428896
Kind Code:
B2
Abstract:
Provided are a substrate processing apparatus and a device manufacturing method, with which fine patterns can be formed with high precision on a substrate. A substrate is coated with a functional layer (a coupling agent) in which a difference in lyophilic/lyophobic properties can be produced by means of optical energy, optical patterning is performed to impart a contrast in the functional layer by means of the lyophilic/lyophobic properties, and then a solution containing a raw material substance for forming an electronic device or the like is converted to a mist by means of ultrasound or the like, and is sprayed onto the substrate surface, thereby causing the mist to adhere to the lyophilic portions of the substrate surface wherein the surface energy is high, and thus selectively depositing the raw material substance.
Inventors:
Kei Nara
Application Number:
JP2017218648A
Publication Date:
November 28, 2018
Filing Date:
November 13, 2017
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
H01L21/336; H01L21/208; H01L21/368; H01L29/786
Domestic Patent References:
| JP2003257866A | ||||
| JP2003273097A | ||||
| JP2005158954A | ||||
| JP2009065012A | ||||
| JP2010258206A | ||||
| JP2098955A | ||||
| JP2004512691A |
Foreign References:
| WO2010001537A1 |
Attorney, Agent or Firm:
Sakai International Patent Office