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Title:
SUBSTRATE ROTATION PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP3378141
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a substrate rotation processing apparatus which prevents contamination of a substrate due to particles generated from a rotation driver.
SOLUTION: A disk storage space 10 is formed between a motor upper cover 5 and a motor fixing flange 7, at a position above a bearing 6 of a spin motor 3. In the disk storage space 10, a rotary disk 12 is fixed to a rotary shaft 4. A sleeve 13 is provided around the rotary shaft 4 at a position above the rotary disk 12 such that gaseous nitrogen is supplied from a gas inlet port 14 and exhausted from an exhaust passage 11 provided at the motor fixing flange 7. By the rotation of the rotary disk 12, the gaseous nitrogen supplied from the gas inlet port 14 is introduced onto the upper surface of the rotary disk 12, and is exhausted with particles generated from the bearing 6, from the exhaust passage 11 to the outside.


Inventors:
Yoshiaki Morizumi
Application Number:
JP7468096A
Publication Date:
February 17, 2003
Filing Date:
March 28, 1996
Export Citation:
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Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classes:
B05C11/08; H01L21/027; H01L21/304; (IPC1-7): H01L21/027; B05C11/08; H01L21/304
Domestic Patent References:
JP871878A
JP8257469A
Attorney, Agent or Firm:
Yoshito Fukushima