SUBSTRATE TREATMENT DEVICE, LOAD LOCK CHAMBER FOR THE SAME, AND CLEANING METHOD OF LOAD LOCK CHAMBER IN SUBSTRATE TREATMENT DEVICE

Title:

SUBSTRATE TREATMENT DEVICE, LOAD LOCK CHAMBER FOR THE SAME, AND CLEANING METHOD OF LOAD LOCK CHAMBER IN SUBSTRATE TREATMENT DEVICE

Document Type and Number:

Japanese Patent JP2002075882

Kind Code:

A

Abstract:

To fully remove particles and build-up in a load lock chamber.

The load lock chamber 2 is airtightly connected to a separation chamber 3 airtightly connected to treatment chambers 11, 12 and 13 where a substrate 9 is specifically treated inside, and a transport mechanism carries the substrate 9 between the atmosphere side and the treatment chambers 11, 12, and 13 via the load lock chamber 2 and the separation chamber 3. The load lock chamber 2 has size and weight so that a human can hold in hands, and at the same time accommodates only a sheet substrate 9, and no transport mechanism is present within the load lock chamber 3. The load lock chamber 2 is connected so that it can be completely separated from the separation chamber 3, and an inner wall surface is cleaned by washing liquid after the separation.

Inventors:

NAKAYAMA HIROKI
KATSUMATA YOSHIHIRO
TAKAHASHI NOBUYUKI

Application Number:

JP2000267771A

Publication Date:

March 15, 2002

Filing Date:

September 04, 2000

Export Citation:

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Assignee:

ANELVA CORP

International Classes:

C23F4/00; H01L21/205; H01L21/302; H01L21/3065; (IPC1-7): H01L21/205; C23F4/00; H01L21/3065

Attorney, Agent or Firm:

Koichi Hotate

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