To improve throughput while obtaining a cleaning system which can continue cleaning, in a cleaning system using persulfate ions.
The sulfuric acid recycling type cleaning system comprises: a single wafer process cleaning equipment 1 for cleaning a material 30 to be cleaned by using a persulfuric acid solution as a cleaning fluid; electrolysis reaction tubs 20 and 25 for reproducing the persulfuric acid solution by generating persulfate ions from sulfuric acid ions contained in the solution by an electrolysis reaction; circulation lines 10a, 10b, 11a and 11b for circulating the persulfuric acid solution between a cleaning tub 1 and the electrolysis reaction tubs 20 and 25 which generate; and an ultraviolet-ray irradiation means 5 for irradiating ultraviolet-ray to the material 30 to be cleaned. Since a sulfuric acid solution is repeatedly used, the persulfuric acid solution can be reused in an on-site way for cleaning by utilizing an electrolysis reaction device. When cleaning, the generation of the sulfuric acid radicals is promoted while being irradiated by ultraviolet-ray to the cleaning solution, resulting in the improvement in the cleaning effect. It becomes possible to shorten working hours and to improve the throughput.
NAGAI TATSUO
YAMAKAWA HARUYOSHI
| JPH06183704A | 1994-07-05 | |||
| JPS55161079A | 1980-12-15 | |||
| JPH07230978A | 1995-08-29 | |||
| JPH11293288A | 1999-10-26 | |||
| JP2001192874A | 2001-07-17 | |||
| JP2005142290A | 2005-06-02 | |||
| JP2004172493A | 2004-06-17 | |||
| JP2003511555A | 2003-03-25 |