To provide a supercritical water reaction device capable of keeping the concentration of an organic chlorine compound in a gas to be released into the atmosphere at a level below a specified value, when a liquid to be treated containing the organic chlorine compound is treated by a supercritical water reaction process.
This supercritical water reaction device 40 is of the same structure as the conventional devices excepting the construction of a gaseous component outflow system 42 connected to a gas/liquid separator 20. The gaseous component outflow system 42 is composed of gas/liquid contact vessels 44A and 44B and gas storage vessels 46A and 46B for storing a gas component which is obtained through a gas/liquid contact, and the system 42 is equipped with two gas/liquid contact lines A and B which are alternately operated independently of each other and a single adsorption vessel 48 installed downstream in the gas/liquid contact line. The gas/liquid contact vessels 44A and 44B store water in the lower parts and are each equipped with an introduction nozzle 56 which introduces the gaseous component separated by the gas/liquid separator 20 into water stored in the gas/liquid contact vessels 44A and 44B, in the lower part. The gaseous component outflow system 42 is equipped with an analysis meter 60 in order to ensure that the concentration of the PCB content of the gaseous component stored in the gas storage vessels 46A and 46B is below a reference valve.
SUZUKI AKIRA
IWAMORI TOMOYUKI
KAWASAKI SHINICHIROU
FUJII TOMONORI
