SUPERFINE PARTICLE FILM DEPOSITION METHOD

Japanese Patent JP2963993

B2

PROBLEM TO BE SOLVED: To remove a contaminated layer and an oxide layer caused by water molecules or the like stuck to the surfaces of superfine particles and a substrate or to activate them by their conversion into the amorphous ones without melting or decomposing the superfine particle material by irradiating the superfine particles and the substrate with high energy beams at high speed so as to realize the mutually firm bonding between the superfine particles and the substrate or between the superfine particles in a low temperature state even in the case a flow of the superfine particles is collided against the substrate at low speed and to deposit, as a result, a dense film having excellent physical properties and tight adhesion for the substrate while maintaining the crystallinity of the superfine particles.
SOLUTION: In this film deposition method of superfine particles in which superfine particles are accelerated and are collided against a substrate 1 to deposit a film in an evacuated chamber 20, the above fine particles and substrate 1 are irradiated with high energy beams at high speed, by which the surfaces of the superfine particles and substrate are activated without being melted, the bonding between the superfine particles and the substrate or between the superfine particles is promoted, and a dense deposit having good film physical properties and good adhesion for the substrate while maintaining the crystallinity of the superfine particles can be formed.

Aketo, Jun
Takagi, Hideki

JP1998000208998

August 13, 1999

July 24, 1998

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AGENCY OF IND SCIENCE & TECHNOL

B01J19/12; C23C4/02; C23C4/12; C23C14/22; C23C24/04; C23C26/00; C23C26/02; (IPC1-7): C23C24/04; B01J19/12; C23C14/22; C23C26/00

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