Title:
SURFACE TREATMENT METHOD, SURFACE TREATMENT APPARATUS, SURFACE TREATMENT SUBSTRATE, ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS
Document Type and Number:
Japanese Patent JP2004311958
Kind Code:
A
Abstract:
To uniformly control a contact angle of a liquid-state object and a substrate even when the substrate is large.
The surface treatment method includes the steps of applying liquid repellent treatment to a surface of a substrate 11, and applying lyophilization treatment to the surface of the substrate 11 to which the liquid repellent treatment is applied, by irradiating the surface with energy light. The step is implemented while suppressing the dispersion of integral illuminance of the energy light on the surface of the substrate less than or equal with 20%.
Inventors:
HIRAI TOSHIMITSU
HASEI HIRONOBU
HASEI HIRONOBU
Application Number:
JP2004035082A
Publication Date:
November 04, 2004
Filing Date:
February 12, 2004
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
B05D3/06; G06K19/077; H01J9/20; H01L21/288; H01L21/3205; H01L21/336; H01L29/786; H05K3/10; G02F1/1333; H05K3/12; H05K3/38; G01N13/02; G02F1/1343; (IPC1-7): H05K3/10; B05D3/06; G02F1/1333; H01L21/288; H01L21/3205; H01L21/336; H01L29/786; H05K3/38
Attorney, Agent or Firm:
Masahiko Ueyanagi
Fujitsuna Hideyoshi
Osamu Suzawa
Fujitsuna Hideyoshi
Osamu Suzawa