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Title:
蒸着装置、蒸着方法及び有機EL表示装置の製造方法
Document Type and Number:
Japanese Patent JP6548761
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus and a vapor deposition method which suppress defects or degradation of an element such as a TFT formed on a substrate to be deposited, as well as degradation of characteristics of an organic layer, even if an electromagnet is used for a magnet of a magnetic chuck.SOLUTION: A vapor deposition apparatus includes: an electromagnet 3; a substrate holder to hold a substrate to be deposited which should be disposed at a position facing one magnetic pole of the electromagnet 3; a vapor deposition mask disposed on a surface opposite to the electromagnet 3 of the substrate to be deposited which is held by the substrate holder, and having a magnetic substance; and a vapor deposition source disposed to face the vapor deposition mask, and vaporizing or subliming a vapor deposition material. There are provided the vapor deposition apparatus having a first electromagnet 3A that the electromagnet 3 forces to generate a magnetic field of a first direction as well as a second electromagnet 3B that the electromagnet 3 forces to generate a magnetic field of a direction reverse to the first direction, and a vapor deposition method of weakening a generated magnetic field by simultaneously operating the first and second electromagnets (3A and 3B) when supplying the current, and then obtaining normal attracting force by turning off the second electromagnet (3B).SELECTED DRAWING: Figure 1

Inventors:
Katsuhiko Kishimoto
Application Number:
JP2018033284A
Publication Date:
July 24, 2019
Filing Date:
February 27, 2018
Export Citation:
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Assignee:
Sakai Display Products Co., Ltd.
International Classes:
C23C14/24; C23C14/04; C23C14/50; G09F9/00; H01L27/32; H01L51/50; H05B33/10
Domestic Patent References:
JP2010106360A
JP6045137A
JP1276707A
JP54148270A
JP10152776A
JP2003187973A
JP2008059757A
Foreign References:
WO2011114829A1
Attorney, Agent or Firm:
Asahina Patent Office



 
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