PURPOSE: To provide a technique more suitable for entirely improving all parts on a mask.

CONSTITUTION: A mask substrate supports an absorbed and phase-shifted element present next to a conventional opaque element. An amplitude at an absorbed part becomes negative so as to help the improvement of an image contrast. In the case that transmissivity is too low, the negative amplitude is not effective since it is too small. In another pole value, since excessive light is transmitted through an area where darkness is requested, the light generates ghost images. An exposure-defocus(E-D) diagram indicates individual improvement points in k2 as the function of the contrast and a normalized focus depth, that is log exposure, and even when the focus depth (DOF) defined by an E-D area in common becomes smaller by attenuation phase shifting, a mask part is improved by various combinations in the contrast and the DOF.