Title:
【発明の名称】光強度計算のパラメトリック解析方法
Document Type and Number:
Japanese Patent JP2910716
Kind Code:
B2
Abstract:
The order of optical conditions and mask conditions necessary required in a photolithography process to be varied is designated so as to minimize the number of recalculations for a transmission cross-coefficient and a Fourier transform of a mask. The conditions are systemically varied and Fourier transforms of the mask and the transmission cross-coefficients are tabulated. With the resultant tables, the parametric analysis for calculating the light intensity distribution is performed.
Inventors:
INUI HIROTOMO
Application Number:
JP537197A
Publication Date:
June 23, 1999
Filing Date:
January 16, 1997
Export Citation:
Assignee:
NIPPON DENKI KK
International Classes:
G01J1/02; G03F7/20; G06G7/48; H01L21/027; (IPC1-7): H01L21/027; G01J1/02; G03F7/20
Domestic Patent References:
| JP7220995A | ||||
| JP737769A | ||||
| JP3216658A | ||||
| JP8314114A |
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)