Title:
【発明の名称】薄膜形成装置
Document Type and Number:
Japanese Patent JP2587924
Kind Code:
B2
Abstract:
This thin film is formed from a high density plasma generated by electron cyclotron resonance utilising microwaves. The apparatus comprises (1) an evacuated wave-guide chamber having on one end a window for introducing microwaves connected to a microwave guide tube (2) a plasma generating chamber having radius and length large enough to form a cavity resonator, (3) a sample chamber, (4) a vacuum chamber having a gas introducing entrance, and (5) a mirror magnetic field generating system surrounding both ends of the plasma generation chamber. (1), (2), and (3) are connected in that order, (5) is designed to entrap the plasma inside a plasma generation chamber by a mirror magnetic field. At least one pair of targets is disposed inside the plasma generation chamber in a direction at right angles to the magnetic flux. The target is supplied with a negative voltage. The sample chamber is connected to the plasma generation chamber in a direction at right angles to the magnetic flux. (1) is furnished with at least one curved part. The window for introducing microwaves is built at a position where it can not be seen through the target.
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Inventors:
MATSUOKA SHIGETO
ONO KENICHI
ONO KENICHI
Application Number:
JP24174086A
Publication Date:
March 05, 1997
Filing Date:
October 11, 1986
Export Citation:
Assignee:
NIPPON TELEGRAPH & TELEPHONE
International Classes:
H01L21/31; C23C14/34; C23C14/35; H01J37/32; H01L21/203; H01L21/285; H05H1/46; (IPC1-7): C23C14/35; H01L21/203; H01L21/285; H01L21/31
Domestic Patent References:
| JP6050167A | ||||
| JP6187867A | ||||
| JP61194174A | ||||
| JP62222064A |
Attorney, Agent or Firm:
Kugoro Tamamushi (2 outside)