Title:
【発明の名称】超微粒子成膜法
Document Type and Number:
Japanese Patent JP2963993
Kind Code:
B1
Abstract:
A method of forming a film of ultrafine particles includes the steps of accelerating ultrafine particles within a vacuum chamber to cause them to collide with a substrate and be deposited, and, at least before said ultrafine particles collide with said substrate, irradiating the ultrafine particles and the substrate with an ionic, atomic or molecular beam or low-temperature plasma or other high-speed, high-energy beam of high-energy atoms or molecules, whereby the surfaces of the ultrafine particles and substrate are activated without being fused, thus promoting bonding between said ultrafine particles and substrate or between the ultrafine particles to form a dense deposit that has good film properties and good adhesion to the substrate while maintaining the crystal properties of the ultrafine particles.
Inventors:
AKETO JUN
TAKAGI HIDEKI
TAKAGI HIDEKI
Application Number:
JP20899898A
Publication Date:
October 18, 1999
Filing Date:
July 24, 1998
Export Citation:
Assignee:
KOGYO GIJUTSU INCHO
International Classes:
C23C4/02; C23C4/12; C23C14/22; C23C24/04; B01J19/12; C23C26/00; C23C26/02; (IPC1-7): C23C24/04; B01J19/12; C23C14/22; C23C26/00
Domestic Patent References:
| JP4350175A | ||||
| JP6116743A |
Attorney, Agent or Firm:
Director, Mechanical Engineering Laboratory, Institute of Industrial Technology
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