Title:
【発明の名称】フォトマスク及び半導体装置の製造方法
Document Type and Number:
Japanese Patent JP3240641
Kind Code:
B2
Inventors:
Takeshi Ohkoshi
Application Number:
JP26203491A
Publication Date:
December 17, 2001
Filing Date:
October 09, 1991
Export Citation:
Assignee:
Seiko Epson Corporation
International Classes:
G03F1/29; G03F1/60; G03F1/68; G03F1/80; H01L21/027; (IPC1-7): G03F1/08; G03F1/14; H01L21/027
Domestic Patent References:
| JP2140743A | ||||
| JP6310162A | ||||
| JP3259256A |
Attorney, Agent or Firm:
Masataka Ueyanagi
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