PURPOSE: To obtain the titled alloy usable even in an environment at high humidity under high vibration by forming an amorphous thin film of a nonmagnetic Ni-Si-B alloy having a specified composition, a low temp. coefft. of electric resistance and high electric resistance on a substrate by a vacuum film forming technique.
CONSTITUTION: An amorphous thin film having a composition represented by a formula NiaSibBc (where each of a, b and c is the atomic vol% of the element, a+b+c=100, 60≤a≤74, 16.5≤b, and 26≤b+c≤40) is formed on a substrate by a vacuum film forming technique such as sputtering. Unlike a conventional film formed by adhesion the resulting amorphous alloy film maintains its reliability and has stable strain gauge characteristics and high sensitivity, so the amorphous alloy film is most suitable for use as material for a strain gauge.
FUKAMICHI KAZUAKI
ISHII MASAMI
MOTOYAMA HIROSHI
YABUNO RIYOUHEI
OKA TETSUO
MASUMOTO TAKESHI
| JPS54122000A | 1979-09-21 |
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