Title:
HIGH CONTRAST PHOTORESIST DEVELOPER
Document Type and Number:
Japanese Patent JPS6012547
Kind Code:
A
Abstract:
A positive photoresist metal ion aqueous developer is provided that gives a high contrast to the photoresist. The developer disclosed comprises a formulation of aqueous alkali-base such as potassium hydroxide and a fluorocarbon surfactant. The incorporation of the fluorocarbon surfactant provides the unexpected increase in the contrast of the photoresist. The addition of the fluorocarbon surfactant increases the gamma from a typical photoresist gamma ( gamma ) of 3 or less to a gamma greater than 10. The high contrast photoresist provides linewidth control and affords improved process latitude in photoresist imaging. The linewidth control is particularly critical in cases where fine lines are to be defined in the resist that covers steps or topography on the coated substrate. The higher the contrast, the less affected the resist by the topography, provided the exposure is adequate to expose the resist. The process latitude afforded by the high contrast is a result of the ability to over develop (develop longer) the exposed resist without affecting the unexposed resist in the adjacent areas.
Inventors:
JIEEMUZU MAABIN RUISU
ROBAATO OOSUCHIN OOUENSU
ANDORIYUU JIYOSEFU BURAKENII
ROBAATO OOSUCHIN OOUENSU
ANDORIYUU JIYOSEFU BURAKENII
Application Number:
JP12500084A
Publication Date:
January 22, 1985
Filing Date:
June 18, 1984
Export Citation:
Assignee:
ALLIED CHEM
International Classes:
G03C1/72; G03C5/08; G03F7/00; G03F7/20; G03F7/26; G03F7/32; H01L21/027; H01L21/30; (IPC1-7): G03C5/24; G03C1/72; G03C5/08; G03F7/00; G03F7/08
Domestic Patent References:
| JPS5051324A | 1975-05-08 | |||
| JPS54116227A | 1979-09-10 | |||
| JPS5740429A | 1982-03-06 |
Attorney, Agent or Firm:
Kyozo Yuasa (4 outside)
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