Title:
TRANSFER-TYPE PHOTOSENSITIVE FILM, METHOD FOR FORMING CURED FILM PATTERN, CURED FILM, AND TOUCH PANEL
Document Type and Number:
Japanese Patent JP2022121441
Kind Code:
A
Abstract:
To provide a transfer-type photosensitive film allowing favorable formation, on an electrode pattern, of a cured film pattern having sufficiently low moisture permeability while inhibiting steps; and a method for forming a cured film pattern and a touch panel that employ the transfer-type photosensitive film.SOLUTION: A transfer-type photosensitive film comprises a supporting film and a first resin layer that is provided on the supporting film. The first resin layer contains a photopolymerizable compound having a tricyclodecane skeleton or a tricyclodecene skeleton, and an acylphosphine oxide-based photopolymerization initiator.SELECTED DRAWING: Figure 1
Inventors:
MINAMI SEISHI
MUKAI IKUO
YOSHIDA HIDEKI
WATANABE OSAMU
WATABE KAZUHITO
WATANABE TAKUMI
AYUGASE TOMOHIRO
EBIHARA MASAHIKO
OKUDA TADASHI
MUKAI IKUO
YOSHIDA HIDEKI
WATANABE OSAMU
WATABE KAZUHITO
WATANABE TAKUMI
AYUGASE TOMOHIRO
EBIHARA MASAHIKO
OKUDA TADASHI
Application Number:
JP2022089813A
Publication Date:
August 19, 2022
Filing Date:
June 01, 2022
Export Citation:
Assignee:
SHOWA DENKO MAT CO LTD
International Classes:
G03F7/027; G03F7/004; G03F7/029; G03F7/031; G03F7/038; G03F7/095; G06F3/041; G06F3/044
Domestic Patent References:
| JP5447939B2 | 2014-03-19 | |||
| JP2016051470A | 2016-04-11 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshinori Shimizu
Hiroyuki Hirano
Hiroaki Aoki
Yoshinori Shimizu
Hiroyuki Hirano
Hiroaki Aoki
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