PURPOSE: To make it possible to use a heat exchanger of a minimum capacity and to increase the discharge amount of a dummy dispensation operation by a method wherein, when a treatment liquid is supplied, a dummy dispensation process is used and at least one part of the dummy dispensation treatment liquid is returned to a heat exchanger.

CONSTITUTION: In a treatment method, a treatment liquid is adjusted to a prescribed temperature which has been decided by a heat exchanger 12 in advance, and a prescribed treatment is executed by supplying the treatment liquid to an object 3 to be treated. In the method, a dummy dispensation process is used when said treatment liquid is supplied, and at least one part of the dummy dispensation treatment liquid is returned to the heat exchanger 12. For example, in a developing treatment apparatus, before a developer is discharged to a wafer 3, a nozzle 5 is moved to the position of a broken line in the figure and a dummy dispensation operation is executed. At this time, the developer is discharged while its amount is a predetermined liquid amount which is smaller than a liquid amount whose temperature can be adjusted by using the heat exchanger 12. After that, when said predetermined liquid amount is discharged, the remaining dummy dispensation developer is returned to the heat exchanger 12 via a filter 19.