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Title:
TREATMENT OF WASTE GAS CONTAINING CHLORINE TRIFLUORIDE
Document Type and Number:
Japanese Patent JPH03217217
Kind Code:
A
Abstract:

PURPOSE: To prevent the discharge of harmful matter by treating a waste gas contg. gaseous chlorine trifluoride with an aq. mixed soln. of an alkali and a sulfite or bisulfite or the solid agent thereof or carrying out the treatment after the waste gas is washed with water.

CONSTITUTION: A waste gas contg. gaseous chlorine trifluoride is washed with an aq. mixed soln. of an alkali (sodium hydroxide is preferably used) and a sulfite or bisulfite (wet treatment). Alternatively, the waste gas is brought into contact with a solid neutralizer or a solid sulfite or bisulfite (dry treatment). Sodium fluoride low in solubility is deposited as a crystal when sodium hydroxide is used in the wet treatment, and solid silicon dioxide and the fluorides are deposited by the reaction of silicon tetrafluoride as the reaction product with the alkali in the dry treatment. Accordingly, the waste gas is previously washed with water to remove the precipitate forming components by the water, and then the treatment is carried out. A waste gas from cleaning is surely treated by such a method, and the discharge of harmful matter is prevented.


Inventors:
NAKAGAWA SHINSUKE
NAKANO HISAHARU
ICHIMARU HIROSHI
TAINAKA MASAHIRO
Application Number:
JP1000490A
Publication Date:
September 25, 1991
Filing Date:
January 19, 1990
Export Citation:
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Assignee:
CENTRAL GLASS CO LTD
International Classes:
B01D53/68; B01D53/34; B01D53/77; (IPC1-7): B01D53/34
Domestic Patent References:
JPS56147614A1981-11-16
JPS61257223A1986-11-14
JPS5219556A1977-02-14
Attorney, Agent or Firm:
Eiichi Sakamoto