To provide an ultrasonic cleaning apparatus which can uniformly clean an object to be cleaned and can reduce damage to the object.
An ultrasonic cleaning apparatus includes: a cleaning tub 2 in which an object 8 to be cleaned is immersed in a cleaning liquid 7; a plurality of ultrasonic vibration elements 302 which are disposed on a bottom of the cleaning tub 2 and vibrate the cleaning liquid 7; a memory part 409 which stores a resonant frequency for each element; an oscillation part 402 having a switchable oscillation frequency; and a control part 401 which switches the elements 302 at random, controls the oscillation part 402 based on the resonant frequency for each element stored in the memory part 409 and supplies high frequency power to the elements.
| JPH04150981 | ULTRASONIC WASHING APPARATUS |
| JPH01135573 | ULTRASONIC WASHING TANK |
| WO2002017355 | SEMICONDUCTOR WAFER CONTAINER CLEANING APPARATUS |
KIKUCHI KAZUYA
| JP2003209086A | 2003-07-25 | |||
| JPH1176941A | 1999-03-23 | |||
| JP2008515612A | 2008-05-15 |
Takakura Shigeo
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Kocho Chojiro
Naoki Kono
Katsu Sunagawa
Morisezo Iseki
Tatsushi Sato
Takashi Okada
Mihoko Horiuchi
Takenori Masanori
Next Patent: DEHUMIDIFIER