Title:
UNSATURATED GROUP-CONTAINING ALKALI-SOLUBLE RESIN AND ALKALI-SOLUBLE RADIATION-SENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2018070724
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an unsaturated group-containing alkali-soluble resin which has a low acid value and is excellent in alkali solubility, development adhesion, resolution and electric characteristics.SOLUTION: An unsaturated group-containing alkali-soluble resin is a reactant of (a) epoxy(meth)acrylate having a fluorene skeleton, (b) epoxy(meth)acrylate having no fluorene skeleton, and (c) a tetracarboxylic acid or its acid dianhydride.SELECTED DRAWING: None
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Inventors:
FUJITA TAKASHI
MUTOBE SO
MUTOBE SO
Application Number:
JP2016210642A
Publication Date:
May 10, 2018
Filing Date:
October 27, 2016
Export Citation:
Assignee:
NAGASE CHEMTEX CORP
International Classes:
C08G63/553; G02B5/20; G03F7/027
Domestic Patent References:
| JP2015155538A | 2015-08-27 | |||
| JP2015127730A | 2015-07-09 | |||
| JP2009014970A | 2009-01-22 | |||
| JP2006003860A | 2006-01-05 | |||
| JP2016071359A | 2016-05-09 | |||
| JPH09304929A | 1997-11-28 |
Foreign References:
| WO2010125949A1 | 2010-11-04 |
Attorney, Agent or Firm:
Atomi International Patent Office