Title:
VACUUM PROCESSOR
Document Type and Number:
Japanese Patent JP3030160
Kind Code:
B2
Abstract:
PURPOSE: To provide a vacuum processor in which throughput can be enhanced while suppressing production of dust without causing increase of size or manufacturing cost.
CONSTITUTION: First and second load lock chambers 1, 2 are arranged in series and three vacuum processing chambers 3a, 3b, 3c are arranged around the first load lock chamber 1. A substrate transfer arm 7 and a buffer mechanism 8 constructed to hold a plurality of sheets of LCD substrates are provided in the first load lock chamber 1. The substrate transfer arm 7 and the buffer mechanism 8 are mounted on a freely rotatable rotary stage 9.
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Inventors:
Tsutomu Hiroki
Application Number:
JP11050692A
Publication Date:
April 10, 2000
Filing Date:
April 28, 1992
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
G02F1/136; G02F1/1368; H01L21/302; H01L21/3065; H01L21/677; (IPC1-7): H01L21/3065; H01L21/68
Domestic Patent References:
| JP469917A | ||||
| JP1251734A |
Attorney, Agent or Firm:
Saichi Suyama