PURPOSE: To provide a vapor deposition apparatus capable of providing a vapor deposited film minimal in the amount of incorporation of impurities at the time of performing heating and vapor deposition and excellent in film quality.

CONSTITUTION: This vapor deposition apparatus is constituted so that an evaporation source material 3 is vapor-deposited on a substrate 5 installed at a prescribed distance from the evaporation source 3 while applying heating to this substrate. Further, this vapor deposition appratus has an electromagnetic induction coil 13, a substrate fixing member 12 being in contact with the above substrate 5 at a part of one principal surface and subjected to electromagnetic induction heating by means of the above electromagnetic induction coil 13, and a substrate holding member 11 fixing the other principal surface of the above substrate fixing member 12, consisting of an insulator, and holding the above substrate in such a manner as being opposed to the above evaporation source 3.