To increase productivity, and to stably control a vapor deposition rate by improving the uniformity of heating of a vapor deposition material.

The vacuum deposition apparatus 1 sublimes or evaporates the vapor deposition material by heating it to vapor-deposit the material on a substrate 9 in a vacuum chamber 2. In the apparatus, an organic material as the vapor deposition material is carried on a porous body having a melting point higher than that of the organic material and also having a thermal conductivity higher than that of the organic material, and the organic material carried on the porous body is used as a vapor deposition source 3.