Title:
VAPOR DRYING DEVICE
Document Type and Number:
Japanese Patent JPS5988827
Kind Code:
A
Abstract:
PURPOSE:To enable clean vapor drying by arranging a mechanism which receives water droplets dropped from a jig and exhausts them, in a vapor chamber. CONSTITUTION:An evaporation medium 4 is contained in the bottom of a container 2 and is vaporized by a heater 1 on the outer wall of the bottom. Upper space 8 of the container is opened to upper space of a drying chamber 9. Bottom of the drying chamber 9 is open and at circumferential part of the opening, a groove 10 projecting inward is arranged. Vapors are solidified on the inside wall by a cooling device 3 and gather in the groove 10 and then return to the container 2 through a hole 11. A plate 13 carrying a jig 12 containing a wafer 7 comprises a projecting brim 14 circumferentially and contains water droplets dropped from the waer or the jig and exhausts them through a tube 15 supporting the plate 13. In this constitution, waste liquor 4 including dust does not flow into the container 2 again thereby drying the wafer and the jig without pollution in the drying chamber 9. If a mechanism for cooling a material to be treated before drying is added, adhering quantity of vapor increases, resulting in further improvement of drying effect.
Inventors:
YOSHIDA KIYOSHI
OKADA TSUNEO
SAKAI KIYOMI
OKADA TSUNEO
SAKAI KIYOMI
Application Number:
JP19753482A
Publication Date:
May 22, 1984
Filing Date:
November 12, 1982
Export Citation:
Assignee:
HITACHI LTD
International Classes:
F26B21/14; H01L21/00; H01L21/304; (IPC1-7): F26B25/00
Attorney, Agent or Firm:
Toshiyuki Usuda
Previous Patent: A method and a device which manufacture compound-filling material
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