Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
VAPOR GROWTH SYSTEM
Document Type and Number:
Japanese Patent JPH03268319
Kind Code:
A
Abstract:

PURPOSE: To eliminate an adverse influence caused by reaction product dust, and secure worker's safety, by installing a gas curtain forming means which spouts a gas curtain outside a gas recovering cover.

CONSTITUTION: A gas feeding head 2 which spouts reaction gas, and a gas recovering cover 1 arranged around the head 2 are installed. A gas curtain forming means 4 which spouts a gas curtain is installed on the outer periphery of the gas recovering cover 1. Inert gas, like N2, supplied from a curtain gas feeding port 5 is made to flow through a pipe inside the gas curtain forming means 4. Hence the inside and the outside of a gas feeding equipment 18 are isolated, and the leak of reaction gas and the permeation of air can be prevented. Thereby a worker can be protected from the danger to be exposed to poisonous gas, and a wafer can be prevented from being contaminated by dust.


Inventors:
KODAMA SHOICHI
TSUCHIYA TADATOSHI
Application Number:
JP6680290A
Publication Date:
November 29, 1991
Filing Date:
March 19, 1990
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TOSHIBA CORP
TOSHIBA MICRO ELECTRONICS
International Classes:
H01L21/205; H01L21/31; (IPC1-7): H01L21/205; H01L21/31
Attorney, Agent or Firm:
Shoko Inomata (1 person outside)