Title:
VAPOR PHASE REACTION APPARATUS
Document Type and Number:
Japanese Patent JPS5223571
Kind Code:
A
Abstract:
PURPOSE: In an apparatus for performing vapor phase reaction such as vapor phase growth on semiconductor substrates, frequencies of mounting and dismounting of quartz plate are reduced.
Inventors:
YAMAMOTO SHINICHI
Application Number:
JP9983575A
Publication Date:
February 22, 1977
Filing Date:
August 19, 1975
Export Citation:
Assignee:
TOKYO SHIBAURA ELECTRIC CO
International Classes:
C30B25/08; B01J12/00; C30B25/10; (IPC1-7): B01J1/00; B01J17/28
Domestic Patent References:
| JPS4913659U | 1974-02-05 |