PURPOSE: To obtain the titled photosensitive sheet suitable for use in the formation of a negative mask by forming a photosensitive film consisting of a specified water-soluble photosensitive resin of a photosetting PVA deriv. and a pigment or dye having no light absorbing power in the photosensitive wavelength region of said resin on a transparent support.
CONSTITUTION: A water-soluble photosensitive resin of a photosetting PVA deriv. contg. photo-cross-linkable constituent units represented by the formula (where m is 0W6; n is 0 or 1; R1 is H or lower alkoxy; R2 is H or alkyl; and X is the anion of a strong acid) is used. A photosensitive film consisting of said resin having ≤350nm maximum photosensitive wavelength and a pigment or dye having light absorbing power in the wavelength region of 370W400nm and transmitting light of ≤350nm is formed on a sheetlike transparent support such as a transparent resin film or a glass sheet to obtain the titled photosensitive sheet. The sheet is exposed and developed by washing to form a desired pattern. This pattern is suitable for use as an original for a diazo photographic material having 370W400nm light absorption band.
INOGUCHI SHIGEO
HONDA FUMIO
KOGYO GIJUTSUIN
OJI PAPER CO
| JPS5562446A | 1980-05-10 | |||
| JPS572034A | 1982-01-07 | |||
| JPS57187166A | 1982-11-17 |