Title:
WATER-SOLUBLE PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP3728803
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a plasma display forming a high-quality phosphor pattern by constituting it with a mixture of a copolymer composition made of vinyl pyrrolidone and vinyl acetate, a phosphor, an acrylic monomer, a photo-polymerization initiator, and a diluent solvent.
SOLUTION: This water-soluble photosensitive resin composition is constituted of a mixture of a copolymer composition made of vinyl pyrrolidone and vinyl acetate, a phosphor, an acrylic monomer, a photo-polymerization initiator, and a diluent solvent. Vinyl acetate is added to vinyl pyrrolidone, and radical polymerization is applied to manufacture the polymer composition made of vinyl pyrrolidone and vinyl acetate. The polymerization ratio of vinyl pyrrolidone in the copolymer is preferably set to 30-70 polymerization pts. The phosphor, acrylic monomer, and polymerization initiator are added to the copolymer, and they are thoroughly mixed and diffused. Ethyl cellosolve, ethyl carbitol, cyclohexanone, or ethyl acetate can be utilized as the diluent solvent.
Inventors:
Jun Sasaki
Eisaburo Watanabe
Ryuichi Nakamura
Eisaburo Watanabe
Ryuichi Nakamura
Application Number:
JP14033396A
Publication Date:
December 21, 2005
Filing Date:
June 03, 1996
Export Citation:
Assignee:
Toppan Printing Co., Ltd.
International Classes:
G03F7/004; G03F7/027; G03F7/028; G03F7/033; H01J9/02; H01J9/227; (IPC1-7): G03F7/033; G03F7/004; G03F7/027; G03F7/028; H01J9/02; H01J9/227
Domestic Patent References:
| JP4116558A | ||||
| JP5061196A | ||||
| JP5224417A |