Title:
リストレスト組立体
Document Type and Number:
Japanese Patent JP3834600
Kind Code:
B2
Abstract:
A wrist rest assembly has a base and a layer of resilient gel supported above the base. The wrist rest assembly is for use adjacent a device operated by a person's hands or fingers, such as a computer keyboard, lap-top or portable computer, computer mouse or other input device. A layer of resilient nonwoven material is disposed between the base and at least a portion of the layer of gel to define, in combination with the layer of gel, a resilient wrist rest support structure supported from the base. A flexible liquid-impervious layer is disposed between the layer of resilient gel and the layer of resilient nonwoven web material.
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Inventors:
Bayer, Glenn H.
Bettenhausen, Larry A.
Bettenhausen, Larry A.
Application Number:
JP51160298A
Publication Date:
October 18, 2006
Filing Date:
January 02, 1997
Export Citation:
Assignee:
3M COMPANY
International Classes:
G06F3/02; A47B21/03; G06F1/16
Domestic Patent References:
| JP10501353A | ||||
| JP5298001A |
Attorney, Agent or Firm:
Takashi Ishida
Jun Tsuruta
Toshio Toda
Masaya Nishiyama
Higuchi Souji
Jun Tsuruta
Toshio Toda
Masaya Nishiyama
Higuchi Souji