A charged particle multi-small beam lithography system and a cooling device manufacturing method

Title:

A charged particle multi-small beam lithography system and a cooling device manufacturing method

Document Type and Number:

Japanese Patent JP5973061

Kind Code:

B2

Abstract:

A charged particle multi-beamlet lithography system comprising a beamlet generator for generating beamlets, a beamlet modulator for forming modulated beamlets, and a beamlet projector for projecting the modulated beamlets onto a target surface. The generator, modulator and/or projector comprise one or more plates provided with apertures for letting the beamlets pass through the plate. The apertures are grouped to form beam areas distinct from non-beam areas having no beamlet apertures. At least one of the plates with apertures is provided with a cooling arrangement (93) disposed on its surface in a non-beam area. The cooling arrangement comprising a plate-shaped body with an inlet (31) for receiving a cooling liquid, a plurality of cooling channels (94) for conveying the cooling liquid therein, and an outlet (35) for removing the cooling liquid. Between the cooling channels, the plate- shaped body has slots (34) that are aligned with the beam areas.

Inventors:

Splengers, Johannes Petrus
Otten, Christian
Jaeger, Remco
Stanblink, Steen Willem Hermann Karel
König, Johann Jost
Urbanus, Willem Genk
Juan Fern, Alexander Hendrick Vincent

Application Number:

JP2015512034A

Publication Date:

August 23, 2016

Filing Date:

May 14, 2013

Export Citation:

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