Title:
A detecting method used for a charged particle microscope
Document Type and Number:
Japanese Patent JP6012191
Kind Code:
B2
Abstract:
A method of investigating a sample using a charged-particle microscope, comprising the steps of:
- Providing a charged-particle microscope, having a particle-optical column;
- Using the particle-optical column to direct an imaging beam of charged particles at the sample;
- Irradiating the sample with the imaging beam, as a result of which a flux ("Photon Flux") of output radiation is caused to emanate from the sample;
- Examining at least a portion of said output radiation using a detector, which method comprises the following additional steps:
- Embodying said detector to comprise a Solid State Photo-Multiplier (1) that is connected to a power supply providing an adjustable electrical bias ("MPPC Bias");
- Adjusting said bias so as to adjust a gain value ("MPPC Gain") of the Solid State Photo-Multiplier;
- Matching said gain value to the magnitude of said flux, so as to cause the Solid State Photo-Multiplier to operate below its saturation threshold.
A Solid State Photo-Multiplier is also sometimes referred to as a Silicon Photo-Multiplier (SiPM), on-chip pixelated Avalanche Photodiode array (with shared/common detection circuitry), MPPC®, etc.
Inventors:
Petr Halavenka
Marek Unkovsky
Marek Unkovsky
Application Number:
JP2012024871A
Publication Date:
October 25, 2016
Filing Date:
February 08, 2012
Export Citation:
Assignee:
FEI COMPANY
International Classes:
H01J37/244
Domestic Patent References:
| JP3295141A | ||||
| JP2009099468A | ||||
| JP2005298603A | ||||
| JP9283072A |
Attorney, Agent or Firm:
Tadahiko Ito
Shinsuke Onuki
Tadashige Ito
Shinsuke Onuki
Tadashige Ito