A device and a method of electrochemistry deposition

Title:

A device and a method of electrochemistry deposition

Document Type and Number:

Japanese Patent JP6013774

Kind Code:

B2

Abstract:

A system is provided in which a smaller flow of deposition solution is diverted from a larger flow of deposition solution flowing on an electrochemical deposition tool platform. The smaller flow is diverted to a dosing unit which may be on a separate platform. The dosing unit in one embodiment comprises a pressurized flow line.

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Inventors:

Joseph Jay. Stevens
Evgeny Rabinovik
Sandies. Chao
Mark Earl. Denome
Allen El. Dambra
Donald Jay. Olgado

Application Number:

JP2012110559A

Publication Date:

October 25, 2016

Filing Date:

May 14, 2012

Export Citation:

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Assignee:

APPLIED MATERIALS,INCORPORATED

International Classes:

C25D17/00; C25D7/12; C25D21/14; C25D21/18; H01L21/288

Domestic Patent References:

JP2000160399A
JP11279797A
JP63277773A

Attorney, Agent or Firm:

Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo

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